Effect of sputtering pressure on the electrochromic properties of flexible NiO films prepared by magnetron sputtering

This study investigates the relationship between the microscopic structure and electrochromic properties of nickel oxide (NiO) thin films and the change in sputtering pressure by depositing NiO films on Polyimide–Indium tin oxide flexible substrates using DC reactive magnetron sputtering. The results demonstrate that the prepared NiO thin films have the best surface morphology and excellent electrochromic properties when the sputtering pressure is 1.0 Pa, sputtering time is 25 min, sputtering power is 125 W, and Ar:O2 ratio is 50:12, with the highest light modulation amplitude of 39.31 %, bleaching and coloring response times of 1.17 and 1.34 s, respectively, and coloring efficiency of 20.05 cm2/C. The findings offer a new method for researching flexible NiO-based electrochromic devices.