抵抗
极紫外光刻
极端紫外线
平版印刷术
纳米技术
紫外线
化学
材料科学
光学
物理
光电子学
激光器
图层(电子)
作者
Jie Cen,Zhengyu Deng,Shiyong Liu
摘要
With the demand for increasingly smaller feature sizes, extreme ultraviolet (EUV) lithography has become the cutting-edge technology for fabricating highly miniaturized integrated circuits. However, the limited brightness of EUV light...
科研通智能强力驱动
Strongly Powered by AbleSci AI