I-Line lithography of poly-(3,4-ethylenedioxythiophene) electrodes and application in all-polymer integrated circuits

Industrialization of polymer electronics requires the use of safe solvents. To that end an I-line lithography process for conducting thin poly(3,4-ethylenedioxythiophene) films has been developed. The fully waterborne process is based on photocrosslinking using bisazide- and polyazide-type photoinitiators. The minimum feature size realized comprises 2.5 μm wide lines separated by 1 μm spacings. The sheet resistance is 1 kΩ/square. The process has been applied to fabricate all-polymer integrated circuits. The technology is demonstrated with functional 15-bit code generators.