Pathfinding by Process Window Modeling: Advanced Dram Capacitor Patterning Process Window Evaluation using Virtual Fabrication

Virtual fabrication was used for process window evaluation and optimization during pathfinding in an advanced DRAM capacitor process. Our results show that the in-spec ratio for an SADP approach will be 10% higher than that of using SAQP under optimized conditions and tightened specifications. The best capacitor area pass-rate (in-spec ratio) using an SADP approach can be enhanced to nearly 100%, while it only reaches 91% for the SAQP process. This research offers a quantified process window comparison for different patterning approaches. Using this approach, the optimal process target combinations and the largest process window can be achieved, prior to performing any wafer-based experimentation.