温室气体
废物管理
半导体器件制造
环境科学
变压吸附
工程类
工艺工程
环境工程
吸附
化学
电气工程
薄脆饼
生态学
有机化学
生物
作者
Wen‐Tien Tsai,Horng-Ping Chen,Wu-Yuan Hsien
标识
DOI:10.1016/s0950-4230(01)00067-5
摘要
Perfluorocarbons (PFCs) are being used as etching/cleaning gases in microelectronic or semiconductor manufacturing processes. These compounds under industrial uses mainly include CF4 (tetrafluorocarbon), C2F6 (hexafluoroethane), C3F8 (octafluoropropane), and cyclo-C4F8 or c-C4F8 (octafluorocyclobutane). From the globally environmental issues and regulatory points of view, it is urgent to control the emissions of these significant greenhouse gases from the industrial processes. This article reviews these PFCs in terms of physiochemical properties, industrial uses, and environmental hazards (e.g. global warming, and toxicity and exposure hazards). Further, it addresses some available recovery/recycle technologies (i.e. cryogenic condensation/distillation, pressure swing adsorption, and membrane separation) of process exhaust gases containing PFCs from semiconductor manufacturing processes in this review paper.
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