等离子体增强化学气相沉积
钝化
材料科学
光电子学
纳米技术
硅
图层（电子）
作者
Pierre Saint‐Cast,Marc Hofmann
出处
期刊：Institution of Engineering and Technology eBooks
[Institution of Engineering and Technology]
日期：2018-11-07
卷期号：: 51-71
摘要
The authors review developments in the use of PECVD in the growth of AlOx layers for solar cells. They consider the microwave PECVD and inductively coupled plasma PECVD methods, and the characteristics of layers grown by the 2 techniques, Si surface passivation, and solar cell applications.
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