分子束外延
纳米线
拓扑绝缘体
扫描隧道显微镜
材料科学
薄膜
反铁磁性
X射线光电子能谱
基质(水族馆)
范德瓦尔斯力
凝聚态物理
霍尔效应
光电发射光谱学
外延
纳米技术
化学
图层(电子)
核磁共振
电阻率和电导率
物理
有机化学
分子
海洋学
地质学
量子力学
作者
Peiyao Xiao,Peng Zhu,Ji Li,Xu Zhang,Lu Qiao,Shuyu Liu,Yuxiang Liu,Zhiwei Wang,Wende Xiao
标识
DOI:10.1021/acs.jpcc.3c01124
摘要
The combination of a topological insulator and an antiferromagnet is expected to exhibit the quantum anomalous Hall effect due to the breaking of the time-reversal symmetry. As a layered antiferromagnet, CoNb3S6 was recently found to exhibit an anomalous Hall effect below the Néel temperature (TN = 29 K). Here, we report the controllable growth of Bi nanowires and Bi2Se3 thin films on CoNb3S6 substrates using molecular beam epitaxy. The composition and morphology of the as-prepared Bi nanowires and Bi2Se3 thin films were studied by atomic force microscopy, X-ray photoelectron spectroscopy, and scanning tunneling microscopy. We found that the as-grown Bi nanowires with abundant sizes are oriented along high-symmetry directions of the substrate, forming firework-like structures. Such firework-like structures of Bi nanowires exhibit a high edge-to-surface ratio as well as a strong anisotropy, highly desirable for photoelectric devices and industrial catalysts. The absence of oxidation peaks verifies that the as-prepared samples are of high quality and air stability, very promising for applications.
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