材料科学
四方晶系
成核
凝聚态物理
铁电性
退火(玻璃)
位错
透射电子显微镜
薄膜
结晶学
纳米技术
复合材料
晶体结构
电介质
光电子学
化学
物理
有机化学
作者
Long Cheng,Heng Zhang,Ran Xu,Kevin Co,Nicolas Guiblin,Mojca Otoničar,Charles Paillard,Yujia Wang,Brahim Dkhil
摘要
The interaction of domain structure and defects in ferroelectric thin films has been studied for decades. However, the role of dislocations and thermal stability of microstructures is still poorly studied. By combining transmission electron microscopy, x-ray diffraction experiments, and phase-field simulations, we show that dislocation pairs induced by post-annealing above 550 °C provide a stress field stabilizing a domains in 30 nm thick tetragonal PbTiO3 films on SrTiO3 substrate, initially exhibiting pure c domains. Based on phase-field simulations, we further discuss the effects of single dislocations and dislocation pairs on the nucleation of a-domains and the occurrence of non-ferroelastic 180° domains. Dislocations, and the possibility to tune them using an appropriate thermal annealing process, offer a path for modulating the domains and domain wall states and, thus, the physical properties of ferroelectric films.
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