碳化硅
功率半导体器件
可靠性(半导体)
材料科学
工程物理
氮化镓
结温
电气工程
晶体管
宽禁带半导体
汽车工业
光电子学
电源模块
功率(物理)
工程类
纳米技术
电压
冶金
航空航天工程
物理
图层(电子)
量子力学
作者
A.O. Adan,Daisuke Tanaka,Lajos Burgyan,Yuji Kakizaki
标识
DOI:10.1109/mpel.2019.2909592
摘要
There is continuous activity to increase the efficiency and reduce the size of power electronic systems and modules developed for transportation and automotive electrification applications [1], [2]. One of the key requirements for achieving these objectives is to operate semiconductor devices at higher power density and junction temperature (Tj max), while maintaining high reliability. The emergence of wideband-gap (WBG) semiconductors [silicon carbide (SiC) and gallium nitride (GaN)] [9] and new high-temperature die-attach methods, interconnects, and packaging materials [9] enables power-device manufacturers to increase Tj max from Tj = 150 °C to Tj = 175 °C and, further, to Tj = 200 °C [3]-[10].
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