材料科学
铁电性
多铁性
扫描透射电子显微镜
记忆电阻器
原子单位
隧道枢纽
极化(电化学)
凝聚态物理
量子隧道
非易失性存储器
透射电子显微镜
纳米技术
光电子学
电介质
电子工程
化学
物理
物理化学
量子力学
工程类
作者
Qiqi Zhang,Xiaoguang Li,Jing Zhu
标识
DOI:10.1021/acsami.1c11661
摘要
Multiferroic tunnel junctions (MFTJs), normally consisting of a four-state resistance, have been studied extensively as a potential candidate for nonvolatile memory devices. More interestingly, the MFTJs whose resistance can be tuned continuously with applied voltage were also reported recently. Since the performance of MFTJs is closely related to their interfacial structures, it is necessary to investigate MFTJs at the atomic scale. In this work, atomic-resolution HAADF, ABF, and EELS of the La0.7Sr0.3MnO3/BaTiO3/La0.7Sr0.3MnO3 MFTJ memristor have been obtained with aberration-corrected scanning transmission electron microscopy (STEM). These results demonstrate varied degree of interfacial cation intermixing at the bottom BTO/LSMO interface, which has a direct influence on the polarization of the ferroelectric barrier BTO and the electronic structure of Mn near the interfaces. We also took advantage of a simplified model to explain the relation between the interfacial behavior and polarization states, which could be a contributing factor to the transport properties of this MFTJ.
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