Analysis of metrological properties of the measurement system to study changes in the resistance of nanocomposite carbon-palladium thin films under the influence of hydrogen

Nanocomposite carbon-palladium thin films were prepared by PVD method on ceramic (Al₂O₃) substrates by our group at Tele & Research Institute in Warsaw. Resistance of these films changed under the influence of hydrogen at different concentration of this gas. Set-up for measurements of resistance changes due to gas influence was designed and built. The set-up is composed of measurement chamber, gas flow controllers, valves and specially devoted to this experiment computer system with SkSysM program developed by the author. In this paper, the measurement system and its metrological properties are described. The uncertainty of measurement of the system during experimental procedure of resistance changes measurements for C-Pd films under influence of hydrogen is described. The uncertainty of measurements, illustrated with the experimental errors for dynamic and static conditions of experiment is also discussed.