薄膜
氢
蒸发
材料科学
调制(音乐)
分析化学(期刊)
无机化学
化学工程
化学
纳米技术
环境化学
有机化学
物理
热力学
声学
工程类
作者
Daisuke Nakamura,Zi-Hao Liu,Hanbo Jung,Masato Sotome,Tomonori Matsushita,Takashi Kondo
标识
DOI:10.35848/1347-4065/add3e2
摘要
Abstract This study presents a four-source co-evaporation technique to precisely control the electrical conductivity of CH 3 NH 3 PbI 3 thin films. By incorporating hydrogen gas (H 2 ) alongside CH 3 NH 2 , HI, and solid-source PbI 2 , we achieved both n -type and p -type doping (∼10 13 –10 14 cm −3 ) while minimizing iodine vacancies (∼10 15 –10 17 cm −3 ). Our circuit current experiments, supported by the defect chemistry model, demonstrate that hydrogen incorporation increases electron carrier density while maintaining low iodine vacancy concentrations with minor impact on crystal quality. X-ray diffraction analysis confirmed that hydrogen incorporation causes lattice expansion.
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