单层
应变工程
凝聚态物理
材料科学
绝缘体(电)
扫描隧道显微镜
相界
纳米尺度
拉伤
相变
原子单位
纳米技术
相(物质)
拉伸应变
极限抗拉强度
化学物理
光电子学
化学
复合材料
物理
医学
内科学
量子力学
有机化学
作者
Baofei Hou,Yu Zhang,Teng Zhang,Jizheng Wu,Quanzhen Zhang,Xu Han,Zeping Huang,Yaoyao Chen,Hongyan Ji,Tingting Wang,Liwei Liu,Si Chen,Hong‐Jun Gao,Yeliang Wang
出处
期刊:Advanced Science
[Wiley]
日期:2023-04-25
卷期号:10 (19): e2300789-e2300789
被引量:9
标识
DOI:10.1002/advs.202300789
摘要
Abstract Monolayer transition metal dichalcogenides (TMDs) can host exotic phenomena such as correlated insulating and charge‐density‐wave (CDW) phases. Such properties are strongly dependent on the precise atomic arrangements. Strain, as an effective tuning parameter in atomic arrangements, has been widely used for tailoring material's structures and related properties, yet to date, a convincing demonstration of strain‐induced dedicate phase transition at nanometer scale in monolayer TMDs has been lacking. Here, a strain engineering technique is developed to controllably introduce out‐of‐plane atomic deformations in monolayer CDW material 1T‐NbSe 2 . The scanning tunneling microscopy and spectroscopy (STM and STS) measurements, accompanied by first‐principles calculations, demonstrate that the CDW phase of 1T‐NbSe 2 can survive under both tensile and compressive strains even up to 5%. Moreover, significant strain‐induced phase transitions are observed, i.e., tensile (compressive) strains can drive 1T‐NbSe 2 from an intrinsic‐correlated insulator into a band insulator (metal). Furthermore, experimental evidence of the multiple electronic phase coexistence at the nanoscale is provided. The results shed new lights on the strain engineering of correlated insulator and useful for design and development of strain‐related nanodevices.
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