六甲基二硅氧烷
材料科学
有机硅
聚对苯二甲酸乙二醇酯
涂层
等离子体聚合
阻挡层
图层(电子)
复合材料
聚乙烯
硅
氧化硅
纳米
接触角
表面能
等离子体
表面粗糙度
表面光洁度
化学工程
聚合
高分子化学
聚合物
光电子学
物理
工程类
氮化硅
量子力学
作者
Montgomery Jaritz,Philipp Alizadeh,Stefan Wilski,Lara Kleines,Rainer Dahlmann
标识
DOI:10.1002/ppap.202100018
摘要
Abstract Hexamethyldisiloxane (HMDSO)‐ and hexamethyldisilazane (HMDSN)‐based plasma polymeric coatings are compared as elements of multilayer barrier coatings, consisting of an alternating structure of organosilicon and silicon oxide layers. Furthermore, these coatings are examined with regard to their deposition rate, critical layer thickness, surface roughness, atomic composition, and gas permeability. It is investigated how these attributes correlate in the overall barrier performance of a multilayer coating system. The concluded examinations show that HMDSN delivers best overall barrier performances as a precursor at high energy densities. For lower energy densities, the use of HMDSO is preferable. Intermediate layer thickness should not exceed six nanometers for best barrier performance in the given experiment configuration.
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