碳纳米管
接触电阻
材料科学
碳化硅
晶体管
纳米技术
电接点
硅
纳米管
金属
碳纤维
碳纳米管场效应晶体管
光电子学
复合材料
场效应晶体管
复合数
冶金
电气工程
工程类
图层(电子)
电压
作者
Qing Cao,Shu-Jen Han,J. Tersoff,Aaron D. Franklin,Yu Zhu,Zhen Zhang,George S. Tulevski,Jianshi Tang,Wilfried Haensch
出处
期刊:Science
[American Association for the Advancement of Science]
日期:2015-10-01
卷期号:350 (6256): 68-72
被引量:201
标识
DOI:10.1126/science.aac8006
摘要
Moving beyond the limits of silicon transistors requires both a high-performance channel and high-quality electrical contacts. Carbon nanotubes provide high-performance channels below 10 nanometers, but as with silicon, the increase in contact resistance with decreasing size becomes a major performance roadblock. We report a single-walled carbon nanotube (SWNT) transistor technology with an end-bonded contact scheme that leads to size-independent contact resistance to overcome the scaling limits of conventional side-bonded or planar contact schemes. A high-performance SWNT transistor was fabricated with a sub-10-nanometer contact length, showing a device resistance below 36 kilohms and on-current above 15 microampere per tube. The p-type end-bonded contact, formed through the reaction of molybdenum with the SWNT to form carbide, also exhibited no Schottky barrier. This strategy promises high-performance SWNT transistors, enabling future ultimately scaled device technologies.
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