A telecentricity matching design for non-critical lithography: Incorporating homogenization induced discreteness of pupil pattern

A lithographic illuminator lens design focused on telecentricity matching is proposed in this manuscript. Each part of the system together with original design concepts and key technology is specifically discussed in detail. The most significant discussion is about the principle and mathematical derivation of the homogenization induced discreteness on pupil pattern. The influence of such discreteness on telecentricity is thoroughly studied based on rod and diffusing components. Also, the factors that impact on telecentricity matching errors such as lens design, misalign and coating defect are discussed and deduced into formula expression. According to the simulation results, our design fully meets the target requirements and our expectation, and the viewpoints on discrete pupil pattern with its impacts on telecentricity are verified. The matching error on reticle level is superior to -1.44 mrad, and the Comprehensive telecentricity on wafer level is less than 4 mrad via simulation.