Synthesis of Photosensitive Cyclopropane-Containing Polymers

New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polymers synthesized. The materials based on them are optically transparent and can be used in microelectronics and optics.