Production of high laser induced damage threshold mirror coatings using plasma ion assisted evaporation, plasma assisted reactive magnetron sputtering and ion beam sputtering

Completing our suite of deposition equipment, we are developing a new Ion Beam Sputtering (IBS) System with different substrate configurations: the High Throughput version (HT) and the High Precision version (HP). The HT version enables the coating of 4 planets of up to 350mm diameter substrates, whereas the HP version allows coating of substrates up to 600mm diameter in a single planet configuration. The IBS system is configured with a Bühler proprietary Optical Monitoring System for layer termination, a large 22cm RF sputtering source, and a LION plasma source for assist. In this presentation the optical performance of this IBS coatings, including LIDT, absorption, total loss and residual coating stress, will be discussed and compared to the other available deposition techniques, such as Plasma Assisted Reactive Magnetron Sputtering, and Plasma Ion Assisted deposition (PIAD). Preliminary results of a 1064nm mirror show less than 5ppm absorption, reflectivity’s of 99.997%, and no visible damage in CW LIDT testing up to 10MW/cm². Pulsed laser damage testing is in process and will be reported. These results will be compared to the coatings being done using PARMS and Evaporation.