锡
氮化钛
材料科学
纳米技术
生物相容性
相容性(地球化学)
可扩展性
生物相容性材料
钛
计算机科学
集成电路
表征(材料科学)
作者
Zonghui Li,Xiaohui Tang,Jiaying Cao,Kaihuan Zhang,Chang Chen,Sijia Xie
标识
DOI:10.1002/admt.202502242
摘要
ABSTRACT Titanium nitride (TiN), a widely used material in conventional integrated circuit (IC) fabrication, has drawn rising attention in the field of healthcare, as it possesses excellent chemical stability, biocompatibility, as well as good electrical conductivity. Owing to its strong compatibility with the Complementary Metal‐Oxide‐Semiconductor (CMOS) processes, TiN holds great promise as a key material for scalable and integrated applications in biomedical sensors, implantable devices, and micro/nanoelectronic systems. This review aims to provide a comprehensive overview of TiN and its potential as an emerging material in biomedical sensing chips. First, the fundamental properties of TiN are summarized, followed by a discussion over the conventional application of TiN in the IC industry. Then, the prospects of TiN as a bioelectrode material are introduced, where its excellent biocompatibility and capability to facilitate efficient electron transport in biomedical electronic chips are highlighted. The following section explores functional modification strategies designed to optimize the performance of TiN which broadens its range of applications. Finally, the potential of TiN in frontier sensing technologies is discussed.
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