An Ultrasensitive Programmable 2D Photoelectric Synaptic Transistor

Abstract The burgeoning advancement of information technology has engendered a discernible surge in the examination of neuromorphic devices, notably drawing broader attention to artificial vision systems endowed with sensory recognition capabilities. Current photoelectric synapse devices employed in artificial vision systems are generally well‐suited for well‐illuminated conditions, yet exhibit diminished sensitivity in weak‐light scenarios, resulting in a pronounced deterioration of recognition accuracy. Here, an ultrasensitive photoelectric synaptic transistor based on negative quantum capacitance effect resulted from the 2D semi‐metallic graphene layer that partially enclosed within the gate dielectric layer, which manifests a noteworthy reduction in device control voltage and exhibits perception and storage capabilities for weak light of 39.4 nW cm−2 with detectivity above 1016 cm Hz1/2 W−1 is demonstrated. The voltage amplification effect and the concomitant formation of an equivalent local electrostatic field induced by the negative quantum capacitance effect engenders a robust programmable synaptic plasticity for extremely weak light by modifying the control gate. These results represent the inaugural integration of the negative quantum capacitance effect into optoelectronic devices and furnish a robust hardware foundation for developing vision systems in weak‐light environments.