量子点
材料科学
铟
光电子学
光致发光
分子束外延
磷化铟
激光器
光谱学
量子阱
透射电子显微镜
蓝移
外延
图层(电子)
砷化镓
纳米技术
光学
物理
量子力学
作者
Jiajing Yuan,Calum Dear,Hui Min Jia,Jae‐Seong Park,Yaonan Hou,Khalil El Hajraoui,Haotian Zeng,Huiwen Deng,Junjie Yang,Mingchu Tang,Siming Chen,Quentin Mathieu Ramasse,Qiang Li,Alwyn J. Seeds,Huiyun Liu
出处
期刊:APL Materials
[American Institute of Physics]
日期:2024-12-01
卷期号:12 (12)
被引量:9
摘要
High-quality InAs/InP quantum dots (QDs) emitting at 1550 nm are indispensable to realize high-performance telecom C-band lasers. In general, a longer emission (>1550 nm) with a broad spectral character has been obtained with InAs/InP QDs. Here, we proposed the use of the indium-flush (IF) method to shorten the emission and improve the optical properties of InAs/InP QDs. By exploiting IF, the full-width at half-maximum of the room-temperature QD photoluminescence spectra is narrowed from 89.2 to 47.9 meV, with a blue shift of 300 nm (from 1824 to 1522 nm). The scanning transmission electron microscopy and electron energy loss spectroscopy results reveal the atomic-level mechanism of the IF method, which uniformly modify the height of InAs/InP QDs in a controlled manner and form distinct Al-rich and In-rich regions. Finally, InAs/InP (001) QD lasers with the IF method have been demonstrated with a low threshold current density per QD layer of 106 A/cm2. We demonstrated both in terms of mechanism model and device performance that the IF method could serve as a robust strategy for the growth of high-performance C-band InAs/InP QD lasers via molecular beam epitaxy.
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