锗
光电子学
硅
二极管
雪崩光电二极管
材料科学
雪崩二极管
光子
砷化镓
单光子雪崩二极管
光学
环境科学
探测器
物理
电气工程
工程类
击穿电压
电压
标识
DOI:10.1109/jsen.2025.3568148
摘要
Ge/Si single- photon avalanche diodes (SPADs) plays a pivotal role in advancing silicon-based optoelectronics by enabling high-sensitivity photodetection at short-wave infrared wavelengths, a critical region for applications such as quantum communication, Light Detection and Ranging (LiDAR), and biological imaging. This review provides a comprehensive overview of Ge/Si SPAD, analyzing the fundamental principles, key performance factors, and optimization methods, including material growth, interface engineering, and structural design. We detail the evolution of major Ge/Si SPAD structures: the initial mesa type with simple design; the planar type, which enhances performance through precise doping; and the lateral type, which simplifies fabrication and innovatively combines vertical absorption with horizontal multiplication. These advancements have driven Ge/Si SPAD toward higher single-photon detection efficiency (SPDE), lower dark count rate (DCR), broader operational wavelengths, and high performance room-temperature operation. Ongoing structural optimizations not only expand design options but also contribute significantly to the advancement of silicon-based optoelectronics.
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