飞秒
折射率
材料科学
激光器
光学
衍射
制作
衍射光栅
氟化物
等离子体
栅栏
光电子学
化学
无机化学
替代医学
病理
物理
医学
量子力学
作者
Sung-Hak Cho,Won−Seok Chang,Jae-Goo Kim,Kwang-Ryul Kim,Jong Wook Hong
标识
DOI:10.1016/j.apsusc.2008.06.186
摘要
The fabrication of internal diffraction gratings with photo-induced refractive index modification in planar fluoride plates was demonstrated using low-density plasma formation excited by a high-intensity femtosecond (130 fs) Ti:sapphire laser (λp = 790 nm). The refractive index modifications with diameters ranging from 350 nm to 5 μm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 1 × 1012 W/cm2. The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred. The maximum refractive index change (Δn) was estimated to be 1.3 × 10−2. The low-density plasma formation (nc < 1.79 × 1027 m−3]) causes the increase of the refractive index modification with fluoride glass.
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