消耗品
持续性
环境影响评价
化学机械平面化
背景(考古学)
资源(消歧)
业务
工程类
计算机科学
机械工程
生态学
计算机网络
生物
抛光
古生物学
营销
作者
Ravitej Venkataswamy,Lyle Trimble,Andrew G. McDonald,Douglas R. Nevers,Leticia Vazquez Bengochea,Andrew T. Carswell,Alan Rossner,Jihoon Seo
标识
DOI:10.1021/acssuschemeng.4c03195
摘要
This paper provides a detailed overview of the environmental impacts and sustainability of chemical mechanical planarization (CMP) consumable manufacturing in the semiconductor industry, especially in the context of rising global demand for semiconductors. It addresses the significant environmental challenges faced by the industry, particularly in terms of energy, water, and material consumption. A thorough examination of the manufacturing processes for key CMP consumables, such as slurries, pads, brushes, cleaning solutions, and conditioners, is discussed. The environmental impact of each process highlights the considerable role CMP consumables play in the industry's overall environmental footprint. The production of CMP slurries and pads is particularly energy- and water-intensive, uses hazardous materials, and significantly contributes to greenhouse gas emissions and resource depletion. While the environmental impacts of PVA brushes, cleaning solutions, and conditioners are relatively minor, their production still requires careful consideration. In response to these challenges, this paper proposes a vision for future CMP sustainability analysis, emphasizing a collaborative approach among chipmakers, consumable manufacturers, and academic institutions to enable the understanding of the environmental impacts of different materials used in consumable manufacturing and assist in the selection of environmentally friendly options. We highlight an urgent need for the CMP community to adopt comprehensive sustainability practices with a particular focus on consumable manufacturing.
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