Kapton
X射线光电子能谱
材料科学
等离子体
羧酸盐
表面改性
分析化学(期刊)
聚酰亚胺
接触角
化学
化学工程
复合材料
有机化学
图层(电子)
物理化学
物理
工程类
量子力学
作者
N. Inagaki,S. Tasaka,K. Hibi
标识
DOI:10.1002/pola.1992.080300722
摘要
Abstract Kapton films were treated with seven plasmas: Ar‐, N 2 ‐, O 2 ‐, CO‐, CO 2 ‐, NO‐, and NO 2 ‐ plasmas. Surface properties and chemical composition of the plasma‐treated Kapton films were investigated from the contact angle measurement, and the IR and XPS spectra. The plasmas, especially NO‐ and NO 2 ‐plasma, made the Kapton film surface hydrophilic. The XPS and IR spectra showed that the plasma led to the modification of the imide groups in the Kapton film to secondary amide and carboxylate groups.
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