光学
平版印刷术
极化(电化学)
光刻
校准
相位板
极紫外光刻
投影(关系代数)
计算机科学
材料科学
物理
算法
量子力学
物理化学
化学
激光器
作者
Yuanhe Li,Jianhui Li,Yanqiu Li,Guodong Zhou
摘要
Polarization aberration of projection optics should be measured, controlled and compensated accurately in high numericalaperture image optical system, such as lithography tools for technical node of 14-5 nm. In this paper, we develop a threestep eigenvalue calibration method for polarization aberration measurement in-situ accurately. The whole system and subsystems can be calibrated by using the wide-view-angle quarter-wave plate as one of the reference samples. In addition, an experimental tool is developed to implement the proposed method, which is of significant importance to quantify and improve the properties of the projection optics in lithography.
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