极紫外光刻
光刻胶
溶解度
离解(化学)
紫外线
极端紫外线
笼子
抵抗
分子
化学
密度泛函理论
笼效应
光化学
材料科学
化学工程
紫外线
辐照
产量(工程)
纳米技术
激发态
水溶液
高对比度
键裂
反应中间体
紫外线照射
反应机理
光刻
含时密度泛函理论
化学物理
工作(物理)
作者
Fangling Yang,Zongbiao Ye,Dongxu Yang,Minghui Wang,Yuqi Chen,Panpan Zhou,Fujun Gou
出处
期刊:Langmuir
[American Chemical Society]
日期:2025-09-25
卷期号:41 (39): 26565-26574
被引量:1
标识
DOI:10.1021/acs.langmuir.5c02055
摘要
The tin-oxo cage is a promising photoresist due to tin’s large extreme ultraviolet (EUV) photon cross-section and small size. CO2 and H2O play a crucial role in increasing the solubility contrast of tin-oxo cages in deep ultraviolet (DUV) and EUV lithography. However, the internal reaction mechanisms remain largely unknown. This work systematically investigated the cleavage of carbon–tin bonds in tin-oxo cages by density functional theory (DFT) upon diverse irradiation (DUV and EUV). Subsequently, the interactions of the resulting intermediates with CO2/H2O (or their hybrid) were examined, revealing that hydroxyl compounds (from the dissociation of H2O) serve as pivotal precursors to trigger new cross-linking reactions (forming Sn–O–Sn and Sn–OCO–Sn products) and enhance the solubility switch. These theoretical results provide insight into the atomic-scale mechanisms of small molecules improving photoresist properties, offering new perspectives for the design and optimization of novel photoresist materials.
科研通智能强力驱动
Strongly Powered by AbleSci AI