MOSFET
绝缘体上的硅
阈值电压
材料科学
光电子学
薄脆饼
表征(材料科学)
晶体管
兴奋剂
半导体
工程物理
电压
电子工程
纳米技术
电气工程
工程类
硅
作者
S. Cristoloveanu,I. Ionica,A. Diab,Fanyu Liu
出处
期刊:ECS transactions
[Institute of Physics]
日期:2013-03-15
卷期号:50 (5): 249-258
被引量:14
标识
DOI:10.1149/05005.0249ecst
摘要
The pseudo-MOSFET (Ψ-MOSFET) is a fascinating transistor based on the upside-down MOS configuration of semiconductor-on-insulator (SOI) wafers. This technique has been conceived for quick characterization of as-grown SOI materials. MOSFET-like characteristics are measured and simple parameter extraction techniques deliver the material properties: carrier mobility and lifetime, threshold and flat-band voltages, density of interface traps and oxide charges, doping level. After reviewing the methodology for reliable characterization, we focus on recent trends enabling the enrichment of the technique.
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