材料科学
抵抗
聚乙烯醇
纳米技术
平版印刷术
响应度
制作
溶解
化学工程
光电子学
复合材料
图层(电子)
病理
工程类
替代医学
医学
光电探测器
作者
Jian Zhang,Chao-Yuan Huang,Yingxin Chen,Hu Wang,Zhongmiao Gong,Weiqian Chen,Haixiong Ge,Xin Hu,Xuefeng Zhang
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2020-07-30
卷期号:31 (42): 425303-425303
被引量:17
标识
DOI:10.1088/1361-6528/ab9da7
摘要
A high-resolution nanopatterning technique is desirable with the present rapid development of hydrogel nanodevices. Here, we demonstrate that polyvinyl alcohol (PVA), a popular polymeric hydrogel, can function as the negative-tone resist for electron beam lithography (EBL) with a resolution capability as narrow as 50 nm half-pitch. Furthermore, the hydrophilic groups of PVA are stable after EBL exposure, and thus the pattern still shows rapid responsivity to humidity change. An aqueous nanopatterning process including dissolution, spin-coating and development is setup, which is friendly for organic device fabrication free of organic solvent. This high-resolution nanopatterning technique with PVA is helpful for the design and realization of hydrogel-related nanodevices in the future.
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