钻石
场效应晶体管
晶体管
击穿电压
电气工程
物理
分析化学(期刊)
光电子学
材料科学
电压
化学
量子力学
工程类
色谱法
复合材料
作者
Takayuki Iwasaki,Junya Yaita,Hiromitsu Kato,Toshiharu Makino,Masahiko Ogura,Daisuke Takeuchi,Hideyo Okushi,Satoshi Yamasaki,Mutsuko Hatano
标识
DOI:10.1109/led.2013.2294969
摘要
Blocking characteristics of diamond junction field-effect transistors were evaluated at room temperature (RT) and 200 ° C. A high source-drain bias (breakdown voltage) of 566 V was recorded at RT, whereas it increased to 608 V at 200 ° C. The positive temperature coefficient of the breakdown voltage indicates the avalanche breakdown of the device. We found that the breakdown occurred at the drain edge of the p-n junction between p-channel and the n + -gates. All four devices measured in this letter showed a maximum gate-drain bias over 500 V at RT and 600 V at 200 ° C.
科研通智能强力驱动
Strongly Powered by AbleSci AI