The paper introduce the photolithography technology. First, the writer explain the process of photolithography. a modern wafer (form IC) will go through a photolithography cycle up to 50 times, some 100 times more. then, the article illustrate photoresist , photoresists are classified two groups :positive resist and negative resist. another important technology is photomask, it is the mass production of IC device,worldwide photomask market was estimated as 3.2 billion in 2012.at the last ,the paper introduce the photolithography machine(tools). The newest feature size of photolithography machine will bring us to 12nm time, maybe 2016.