A 0.6 μm CMOS pinned photodiode color imager technology
作者
R. Michael Guidash,T.-H. Lee,P.P.K. Lee,D.H. Sackett,Cliff I. Drowley,M.S. Swenson,L. Arbaugh,R. Hollstein,F. Shapiro,Steve Domer
出处
期刊:Technical digest [Institute of Electrical and Electronics Engineers] 日期:2002-11-22卷期号:: 927-929被引量:102
标识
DOI:10.1109/iedm.1997.650533
摘要
The world's first submicron pinned photodiode CMOS image sensors have been produced by adding an optimized image sensor module to a 3.3 V, 0.6 /spl mu/m CMOS process. The 4-transistor pixel cells achieve excellent blue response, low dark current, and good dynamic range. A full-color imager with good color reproduction has been produced using this technology.