废水
紫外线
化学
抗生素
细菌
抗生素耐药性
污水处理
制浆造纸工业
环境化学
微生物学
环境科学
环境工程
材料科学
生物
生物化学
工程类
遗传学
光电子学
作者
Weiwei Ben,Liu Liu,Ying Gao,Zhe Sun,Junyi Li,Zhimin Qiang
出处
期刊:ACS ES&T water
[American Chemical Society]
日期:2024-02-21
卷期号:4 (4): 1680-1687
被引量:7
标识
DOI:10.1021/acsestwater.3c00728
摘要
Swine wastewater is considered one of the major pollution sources of antibiotic resistance to the environment. In this study, the elimination of antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs) through various treatment processes, including ultraviolet (UV), O3, and their combined processes, in biotreated swine wastewater was investigated. The combination modes of UV and O3 were optimized, and the mechanisms underlying ARG removal were explored by assessing the destruction of intracellular ARGs (i-ARGs) and extracellular ARGs (e-ARGs). The results indicated that the synchronous exposure to UV and O3 (i.e., the UV/O3 process) was the optimal combination mode, which could accelerate the removal of ARB and enhance the elimination of target ARGs (i.e., tetA, ermA, and intI1) by a maximum of 0.9–1.3 and 0.4–0.8 logs, respectively, when compared to the single ozonation and UV treatments. The concurrent destruction of i-ARGs and e-ARGs implied that the advanced oxidation properties of the UV/O3 process compensated for the limitations of ozonation in a complex wastewater matrix and capitalized on the strengths of both UV and ozonation in damaging ARGs. Overall, UV/O3 is a feasible polishing process, subsequent to biological treatment, for effectively abating antibiotic resistance from swine wastewater.
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