极紫外光刻
显微镜
聚光镜(光学)
光学
极端紫外线
材料科学
激光器
波长
波带板
显微镜
图像分辨率
分辨率(逻辑)
紫外线
衍射
光源
计算机科学
物理
人工智能
作者
P. Wachulak,A. Torrisi,Andrzej Bartnik,Łukasz Węgrzyński,Tomasz Fok,Henryk Fiedorowicz
出处
期刊:Applied Physics B
[Springer Science+Business Media]
日期:2016-12-24
卷期号:123 (1)
被引量:19
标识
DOI:10.1007/s00340-016-6595-5
摘要
A compact, desktop size microscope, based on laser-plasma source and equipped with reflective condenser and diffractive Fresnel zone plate objective, operating in the extreme ultraviolet (EUV) region at the wavelength of 13.8 nm, was developed. The microscope is capable of capturing magnified images of objects with 95-nm full-pitch spatial resolution (48 nm 25–75% KE) and exposure time as low as a few seconds, combining reasonable acquisition conditions with stand-alone desktop footprint. Such EUV microscope can be regarded as a complementary imaging tool to already existing, well-established ones. Details about the microscope, characterization, resolution estimation and real sample images are presented and discussed.
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