凝聚态物理
物理
磁电阻
结晶学
材料科学
化学
量子力学
磁场
作者
Cheng Jin,Yonggang Wang,Meiling Jin,Zimin Jiang,Dequan Jiang,Junlong Li,Yuki Nakamoto,Katsuya Shimizu,Jinlong Zhu
出处
期刊:Physical review
[American Physical Society]
日期:2022-04-04
卷期号:105 (14)
被引量:7
标识
DOI:10.1103/physrevb.105.144402
摘要
Quantum spin liquid (QSL) state has attracted a great deal of attention as a precursor of high-temperature superconductor. The promising QSL candidates such as $\ensuremath{\alpha}\text{\ensuremath{-}}{\mathrm{RuCl}}_{3}, {\mathrm{Na}}_{2}{\mathrm{IrO}}_{3}$ and $\ensuremath{\alpha}\text{\ensuremath{-}}{\mathrm{Li}}_{2}{\mathrm{IrO}}_{3}$ with honeycomb structure are insulators or semiconductors. An insulator-metal transition (IMT) is necessary for hosting superconducting state. However, all of them have a robust insulating state, even under pressure. Here, an alternative candidate of QSL, ${\mathrm{Cu}}_{2}{\mathrm{IrO}}_{3}$ is investigated under high pressure and low temperature through x-ray diffraction and electric properties measurement. A dimerization occurs at 7.1 GPa which is similar to $\ensuremath{\alpha}\text{\ensuremath{-}}{\mathrm{RuCl}}_{3}$ and $\ensuremath{\alpha}\text{\ensuremath{-}}{\mathrm{Li}}_{2}{\mathrm{IrO}}_{3}$, accompanied with an anomaly of resistance at $\ensuremath{\sim}5.0\phantom{\rule{0.16em}{0ex}}\mathrm{GPa}$. The IMT appears under a pressure of $\ensuremath{\sim}13.8\phantom{\rule{0.16em}{0ex}}\mathrm{GPa}$, which is absent in $\ensuremath{\alpha}\text{\ensuremath{-}}{\mathrm{RuCl}}_{3}, {\mathrm{Na}}_{2}{\mathrm{IrO}}_{3}$ and $\ensuremath{\alpha}\text{\ensuremath{-}}{\mathrm{Li}}_{2}{\mathrm{IrO}}_{3}$ under pressure. It is related to the crystal structure transition at $\ensuremath{\sim}11.1\phantom{\rule{0.16em}{0ex}}\mathrm{GPa}$, which induces the decline of interlayer distance. Furthermore, a strange crossover from negative to positive magnetoresistance is observed under pressure of 21.8 to 24.2 GPa at 2 K. This may be due to the valence change of ${\mathrm{Cu}}^{+}$ to ${\mathrm{Cu}}^{2+}$, as a result of the decreasing of interlayer distance and the shortening of O--Cu--O bond under pressure.
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