Decoupling the roles of defects/impurities and wrinkles in thermal conductivity of wafer-scale hBN films

材料科学 热导率 拉曼光谱 热阻 薄脆饼 热接触电导 复合材料 扩展阻力剖面 氮化硼 传热 光学 光电子学 热力学 物理
作者
Kousik Bera,Dipankar Chugh,Aditya Bandopadhyay,Hark Hoe Tan,Anushree Roy,Chennupati Jagadish
出处
期刊:Journal of Applied Physics [American Institute of Physics]
卷期号:134 (15)
标识
DOI:10.1063/5.0168186
摘要

We demonstrate a non-monotonic evolution of in-plane thermal conductivity of large-area hexagonal boron nitride films with thickness. Wrinkles and defects/impurities are present in these films. Raman spectroscopy, an optothermal non-contact technique, is employed to probe the temperature and laser power dependence property of the Raman active E2ghigh phonon mode, which, in turn, is used to estimate the rise in the temperature of the films under different laser powers. As the conventional Fourier law of heat diffusion cannot be directly employed analytically to evaluate the thermal conductivity of these films with defects and wrinkles, finite-element modeling is used instead. In the model, average heat resistance is used to incorporate an overall near-surface defect structure, and Voronoi cells with contact resistance at the cell boundaries are constructed to mimic the wrinkled domains. The effective in-plane thermal conductivity is estimated to be 87, 55, and 117 W/m K for the 2, 10, and 30 nm-thick films, respectively. We also present a quantitative estimation of the thermal resistance by defects and wrinkles individually to the heat flow. Our study reveals that the defects/impurities render a much higher resistance to heat transfer in the films than wrinkles.

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