分子束外延
霍尔效应
透射电子显微镜
凝聚态物理
材料科学
量子反常霍尔效应
基质(水族馆)
外延
磁化
矫顽力
图层(电子)
电阻率和电导率
光电子学
量子霍尔效应
磁场
纳米技术
物理
地质学
海洋学
量子力学
作者
Yusuke Nakazawa,Takafumi Akiho,Kiyoshi Kanisawa,Hiroshi Irie,N. Kumada,K. Muraki
摘要
We report the growth, structural characterization, and transport properties of the quantum anomalous Hall insulator Vy(BixSb1−x)2−yTe3 (VBST) grown on a GaAs buffer layer by molecular beam epitaxy on a GaAs(111)A substrate. X-ray diffraction and transmission electron microscopy show that the implementation of a GaAs buffer layer improves the crystal and interface quality compared to the control sample grown directly on an InP substrate. Both samples exhibit the quantum anomalous Hall effect (QAHE), but, with similar thermal stability despite their different structural properties. Notably, the QAHE in the sample grown on a GaAs buffer layer displays a significantly larger (almost double) coercive field with a much smaller resistivity peak at magnetization reversal. Possible effects of the interface quality on the magnetic properties of VBST and the QAHE are discussed.
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