极紫外光刻
材料科学
平版印刷术
纳米技术
极端紫外线
计算机科学
光电子学
光学
物理
激光器
作者
Fangling Yang,Zongbiao Ye,Yuqi Chen,Panpan Zhou,Fujun Gou
标识
DOI:10.1021/acs.jpclett.4c03250
摘要
Obtaining effective extreme ultraviolet lithography (EUVL) materials for pragmatic applications remains challenging. The experimental design and conventional theoretical prediction are time-consuming and costly and hardly affordable to accelerate the discovery of commercial EUVL materials. In this work, we employed the machine learning (ML) technique to predict the ionization potential of promising EUVL materials, which is closely related to the photoresists' solubility switch. The developed ML model presents a strong generalization ability and can predict new EUVL materials containing different metals (i.e., Mg, Cu, Ca, Cd, Ni). Furthermore, feature analysis indicates that the number of hydrogen bond donors in a compound plays a vital role in determining the ionization potential of EUVL materials. The work provides not only an effective ML model to predict EUVL materials but also crucial insights into the correlation between the structure and properties. Finally, the developed ML model has been integrated into an online platform (https://zinc-oxo-cluster-predictor.streamlit.app/), allowing users to quickly evaluate their designed materials and develop a comprehensive scheme for discovering promising EUVL compounds based on our platform.
科研通智能强力驱动
Strongly Powered by AbleSci AI