Effect of indium content and carrier distribution on the efficiency and reliability of InGaN/GaN-based multi quantum well light emitting diode

光电子学 俄歇效应 材料科学 发光二极管 量子阱 载流子寿命 可靠性(半导体) 二极管 铟镓氮化物 降级(电信) 量子效率 氮化镓 螺旋钻 电子工程 光学 物理 纳米技术 原子物理学 功率(物理) 量子力学 激光器 工程类 图层(电子)
作者
Claudia Casu,Matteo Buffolo,Alessandro Caria,Carlo De Santi,Enrico Zanoni,Gaudenzio Meneghesso,Matteo Meneghini
出处
期刊:Microelectronics Reliability [Elsevier BV]
卷期号:126: 114377-114377 被引量:1
标识
DOI:10.1016/j.microrel.2021.114377
摘要

Abstract This paper investigates the mechanisms that limit the efficiency and the reliability of InGaN-based LEDs, by presenting an analysis carried out on devices having two quantum wells that emit at different wavelengths (405 nm and 495 nm). A color-coded test structure was designed in order to easily quantify the optical characteristics of both quantum wells, and to describe in detail the stress dynamics as a function of In-content and of the position of the quantum wells. The attention was focused on: (i) electrical degradation induced by constant current stress at high temperature, that was found to be related to a diffusion process; (ii) degradation of the optical parameters, which was dominantly ascribed to an increase in SRH recombination and to a decreased carrier injection efficiency; (iii) effect of indium content and carrier distribution on the efficiency and reliability of the devices. The results strongly suggest that the internal quantum efficiency is limited by a low injection efficiency and by the quantum confinement Stark effect. In addition, the results on optical degradation highlight the presence of different mechanisms that contribute to the degradation: the role of Shockley-Read-Hall recombination, carrier escape and Auger processes are discussed.
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