电致发光
材料科学
高电子迁移率晶体管
光电子学
钝化
压力(语言学)
薄膜晶体管
晶体管
电压
复合材料
图层(电子)
电气工程
语言学
工程类
哲学
作者
Qiang Ma,Shiyo Urano,Yuji Ando,Atsushi Tanaka,Akio Wakejima
标识
DOI:10.35848/1882-0786/ac1f40
摘要
This letter reports an impact of SiN film stress on electroluminescence (EL) of AlGaN/GaN HEMTs. The EL color of HEMTs turned from high-intensity white to low-intensity red, as the SiN film stress was increased from −24.2 (compressive) to +11.5 MPa (tensile). The weak reddish EL from the HEMT with a film stress of +11.5 MPa turned bright whitish when a drain-to-source voltage (Vds) was increased. A transient Id response after biasing stress revealed that severe current collapse emerged in the HEMT with a film stress of −24.2 MPa. In addition, the current collapse in HEMTs increased with the increased Vds.
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