Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography

Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography, Ng, Philip C. W., Chien, Sheng-Wei, Chang, Bo-Sen, Tsai, Kuen-Yu, Lu, Yi-Chang, Li, Jia-Han, Chen, Alek C.