Infrared dielectric response of nanoscribe IP-dip and IP-L monomers after polymerization from 250 cm^−1 to 6000 cm^−1

Direct laser writing via two photon polymerization has enabled previously unavailable degrees of freedom in the additive fabrication of micro-to-meso scale structures. The structures produced by these techniques are ideally suited to create optical devices which operate from the THz regime to the near infrared spectrum into the visible spectral range. Here we report on the infrared dielectric response of two monomers IP-dip and IP-L after polymerization which are frequently employed in commercial two photon lithography tools from nanoscribe over the spectral range of 250 cm−1 to 6000 cm−1. A parameterized dielectric function model is presented and discussed.