光伏
硅
材料科学
降级(电信)
钝化
可靠性(半导体)
太阳能电池
光电子学
兴奋剂
串联
工程物理
纳米技术
晶体硅
光伏系统
共发射极
紫外线
薄脆饼
氧化物
硅太阳电池
聚合物太阳能电池
空间环境
作者
Yihao Zhou,Muhammad Umair Khan,Shuo Deng,Yalun Cai,Zichen Wang,Martin A. Green,Ning Song
出处
期刊:
[Elsevier BV]
日期:2026-08-01
卷期号:: 101276-101276
标识
DOI:10.1016/j.device.2026.101276
摘要
Ultraviolet-induced degradation (UVID) is a reliability concern for high-efficiency crystalline silicon photovoltaics. The understanding of its mechanisms is important as technologies evolve beyond passivated emitter and rear contact (PERC) toward passivating-contact, back-contact, tandem, and space applications. This review discusses UVID in silicon solar cell structures including PERC, TOPCon (tunnel oxide passivated contact), HJT (heterojunction technology), and BC (back contact) technologies. We analyze the coupled interfacial and bulk degradation pathways associated with ultraviolet illumination. Recent advances in mitigation strategies are evaluated, spanning passivation engineering, doping design, optical spectral management, and post-exposure recovery treatments. Reliability considerations in next-generation back-contact structures, silicon-based tandem cells, and extreme operating environments such as space under AM0 conditions are highlighted. By linking mechanistic insights with technology-relevant design strategies, we outline research directions required to ensure that efficiency gains in modern silicon photovoltaics are accompanied by long-term stability.
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