材料科学
单层
从头算
化学气相沉积
石墨烯
带隙
半导体
氢
背景(考古学)
分子束外延
宽禁带半导体
纳米技术
扫描隧道显微镜
从头算量子化学方法
化学物理
光电子学
外延
图层(电子)
分子
化学
有机化学
古生物学
生物
作者
Edward Ferraz de Almeida,A. Kakanakova‐Georgieva,Gueorgui K. Gueorguiev
出处
期刊:Materials
[Multidisciplinary Digital Publishing Institute]
日期:2024-01-27
卷期号:17 (3): 616-616
被引量:5
摘要
Mono- and few-layer hexagonal AlN (h-AlN) has emerged as an alternative “beyond graphene” and “beyond h-BN” 2D material, especially in the context of its verification in ultra-high vacuum Scanning Tunneling Microscopy and Molecular-beam Epitaxy (MBE) experiments. However, graphitic-like AlN has only been recently obtained using a scalable and semiconductor-technology-related synthesis techniques, such as metal–organic chemical vapor deposition (MOCVD), which involves a hydrogen-rich environment. Motivated by these recent experimental findings, in the present work, we carried out ab initio calculations to investigate the hydrogenation of h-AlN monolayers in a variety of functionalization configurations. We also investigated the fluorination of h-AlN monolayers in different decoration configurations. We find that a remarkable span of bandgap variation in h-AlN, from metallic properties to nar-row-bandgap semiconductor, and to wide-bandgap semiconductor can be achieved by its hy-drogenation and fluorination. Exciting application prospects may also arise from the findings that H and F decoration of h-AlN can render some such configurations magnetic. We complemented this modelling picture by disclosing a viable experimental strategy for the fluorination of h-AlN.
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