德鲁德模型
半导体
凝聚态物理
材料科学
折射率
合金
电子
有效质量(弹簧-质量系统)
等离子体
放松(心理学)
带隙
电子迁移率
物理
光电子学
量子力学
心理学
社会心理学
复合材料
作者
Bratati Mukhopadhyay,Shyamal Mukhopadhyay,P. K. Basu
标识
DOI:10.1117/1.jnp.16.026004
摘要
Classical Drude model has long been employed to study the plasma behavior of metals. The model has also been used for semiconductors to obtain the expressions for plasma frequency and carrier-induced changes in refractive index and absorption in terms of effective mass, transport relaxation time, and mobility of the carriers. However, these expressions remain invalid for semiconductors in which carriers occupy different valleys, as in strained SiGe alloys, GeSn alloys, and even in GaAs or InP under high electric field. We modify Drude equations for occupancy of two valleys by electrons and show deviations from standard textbook expressions. The conditions for recovering known expressions are then established. To illustrate, we consider unstrained GeSn alloys over the range 0 < x < 0.2 in which L and Γ conduction band valleys cross positions at x = 0.08 resulting in a crossover from indirect to direct nature of the band gap. A comparison is made between the present values with values obtained previously.
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