First Reaction of a Bare Silicon Surface with Acid Chlorides and a One-Step Preparation of Acid Chloride Terminated Monolayers on Scribed Silicon

烷基 化学 单层 X射线光电子能谱 氯化物 无机化学 钝化 酰氯 二次离子质谱法 光化学 有机化学 高分子化学 离子 化学工程 图层(电子) 生物化学 工程类
作者
Yit‐Yian Lua,William J. J. Fillmore,Yang Li,Michael V. Lee,Paul B. Savage,Matthew C. Asplund,Matthew R. Linford
出处
期刊:Langmuir [American Chemical Society]
卷期号:21 (6): 2093-2097 被引量:25
标识
DOI:10.1021/la047338h
摘要

Methyl-terminated and acyl chloride terminated monolayers are produced when silicon is scribed under mono- and diacid chlorides, respectively. To the best of our knowledge, this is the first report of the reaction between a bare silicon surface and acid chlorides. This reaction takes place by wetting the silicon surface in the air with the acid chloride and scribing. Scribing activates the silicon surface by removing its passivation layer. We propose that scribed silicon abstracts chlorine from an acid chloride to form an Si-Cl bond and that the resulting acyl radical diffuses back to the surface to condense with the surface and form an alkyl monolayer. X-ray photoelectron spectroscopy (XPS) confirms the presence of chlorine and shows a steady increase in the amount of carbon with increasing alkyl chain lengths of the acid chlorides. Time-of-flight secondary ion mass spectrometry shows SiCl(+) species and a steady increase in representative hydrocarbon fragments with increasing alkyl chain lengths of the acid chlorides. XPS indicates that diacid chlorides react primarily at one of their ends to create acyl chloride terminated surfaces in a single step. The resulting surfaces are shown to react with various amines (piperazine, morpholine, and octylamine) and a protein. Calculations at Hartree-Fock and density functional theory levels are consistent with the proposed mechanism.
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