Effect of growth rate on crystallization of HfO2 thin films deposited by RF magnetron sputtering

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation M. Dhanunjaya, N. Manikanthababu, A. P. Pathak, S. V. S. Nageswara Rao; Effect of growth rate on crystallization of HfO2 thin films deposited by RF magnetron sputtering. AIP Conf. Proc. 23 May 2016; 1731 (1): 080071. https://doi.org/10.1063/1.4947949 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioAIP Conference Proceedings Search Advanced Search |Citation Search