计量学
触针
校准
光学
材料科学
千分尺
表面光洁度
共焦
表面计量学
计算机科学
表面粗糙度
计算机视觉
轮廓仪
物理
量子力学
复合材料
作者
Roger Artigas,Agustı́ Pintó,Ferran Laguarta
摘要
One of the objectives of surface metrology is to obtain a better and faster assessment of the micro- or nanogeometry of component surfaces. In this way the innovative concept of the profiler is changing towards non-contact modular computer- controlled systems for measuring and analyzing shape and texture of a surface. In this paper we present a new instrument which is based on the concept of confocal microscopy. In this instrument (which may be used for measurements on smooth and rough surfaces) a pattern of slits is imaged by a very high numerical aperture optical system on the surface of the sample to be measured. The reflected or diffused light is observed with a CCD array and analyzed with different digital image processing algorithms. In addition to the replacement of the existing stylus systems there are also important new potential applications for this type of instrument. We present the results obtained in micro- or nanomeasurements of high precision optical surfaces, texture assessment of non-homogeneous liquid depositions and metrology of microstructures such as master gratings and certified calibration standards. The obtained results show that the confocal profiler is robust enough to provide a surface topography with spatial resolution lower than 0.5 micrometer and uncertainty of about 10 nm.
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