材料科学
栅栏
纳米技术
工程物理
光电子学
工程类
作者
Jiawei Zhang,Jirigalantu Jirigalantu,Shuo Yu,Yilong Wang,Hongzhu Yu,Wenhao Li
标识
DOI:10.1016/j.jmapro.2024.09.033
摘要
In the 1990s, Professor Stephen Chou from Princeton University introduced the concept of nanoimprint lithography , a novel method for manufacturing nanostructures using templates. Grating replication involves using these processed gratings as molds to create replicas. However, traditional grating replication methods are complex and inefficient. By incorporating fast nanoimprinting technology into grating replication, production efficiency can be significantly improved, which is crucial for large-scale grating replication. This article reviews the recent advancements in nanoimprinting for grating preparation both domestically and internationally. It summarizes the development process, identifies the challenges in grating replication technology using nanoimprinting, and anticipates future trends in high-precision grating replication.
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