异质结
材料科学
纤锌矿晶体结构
压电
光电子学
宽禁带半导体
晶体管
电子
凝聚态物理
极化(电化学)
化学
电压
复合材料
物理
物理化学
量子力学
锌
冶金
作者
O. Ambacher,Joseph A. Smart,J. R. Shealy,Nils G. Weimann,K. Chu,Michael J. Murphy,William J Schaff,LESTER F. EASTMAN,Roman Dimitrov,L.L. Wittmer,M. Stutzmann,Walter Rieger,Jochen Hilsenbeck
摘要
Carrier concentration profiles of two-dimensional electron gases are investigated in wurtzite, Ga-face AlxGa1−xN/GaN/AlxGa1−xN and N-face GaN/AlxGa1−xN/GaN heterostructures used for the fabrication of field effect transistors. Analysis of the measured electron distributions in heterostructures with AlGaN barrier layers of different Al concentrations (0.15
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